Active magnetic field compensation system MACOM II | Müller-BBM Industry Solutions

MACOM II®

Magnetic field compensation for optimal interference reduction

Significant reduction of magnetic interference fields in electron beam lithography and electron microscopy thanks to the MACOM II® active magnetic field compensation system.

Your Benefits

✔ Effective interference field reduction: Maximum field reduction performance with extremely low noise levels – for highest precision in sensitive applications

✔ Maximum operational efficiency: Individually configurable for a wide range of applications – from research to industry

✔ Flexible system solutions: Magnetic field compensation for optimal interference field reduction

Typical areas of application

Research: Electron microscopy – improving resolution by reducing magnetic interference fields.
Semiconductor industry: Electron beam lithography – magnetic field reduction for precise structures in the nanometre range
General applications: All types of equipment – stable magnetic field conditions for trouble-free operation of sensitive systems

Technical Data

Field reduction performance*	0.1 Hz to 1 kHz: 60 dB 1 kHz to 5 kHz: 60 dB to 40 dB 5 kHz to 100 kHz: 40 dB to 0 dB
Dynamic range	> 100 dB
Noise (0.1 Hz – 10 kHz)*	< 0.2 nTRMS
Long-term stability	< 1 nTRMS
Maximum interference field	approx. 10 µT
Output current	3 x 3 A
PC interface	RS 232, Ethernet
Power supply	115 V or 230 V (adjustable), 50 Hz or 60 Hz
Form factor	19" (4 U) – rack-mount or desktop housing